▣ Well suitable also for the use as an etch mask exhibiting high dry and wet etch resistance
▣ Specifically designed for electroplating of structures in microsystems technology
▣ High stability in acid and alkaline plating baths
▣ Good thermal stability of the resist patterns attainable
▣ Side wall angle up to 87° with mask aligner broadband exposure
▣ Easy removal
▣ Resists available in a variety of viscosities