제품 기본설명
Thermoplastic Polymer for Nanoimprint Lithography with Improved Release Properties series
제품 상세설명
▣ Excellent properties for thermal NIL - Short cycle times due to fast polymer flow, Sub-20 nm resolution, Low residual layer thickness, Low release forces
▣ Longer life-time of anti-sticking layers on the mould▣ High plasma etch resistance comparable to novolak-based photoresists
관련제품
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