제품 기본설명
Photochemically Curing Resist for Thermal Nanoimprint Lithography series
제품 상세설명
▣ Excellent film quality
▣ Tg 40°C (before curing)▣ Imprinting, UV flood exposure, annealing and mould release i at the same temperature
▣ Smallest feature size at least 50 nm(depending on mould resolution)
▣ Very low residual layer thickness < 10 nm
▣ Excellent pattern transfer fidelity
▣ Plasma etch resistance comparable to conventional novolak-based photoresists
관련제품
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